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Manuscript Title: A program to solve a solute diffusion problem with segregation at a moving interface.
Authors: M. Bakker, D. Hoonhout
Program title: DIFSEG
Catalogue identifier: ABVZ_v1_0
Distribution format: gz
Journal reference: Comput. Phys. Commun. 22(1981)439
Programming language: Fortran.
Computer: CYBER 74/175.
Operating system: NOS/BE.
RAM: 128K words
Word size: 60
Peripherals: graph plotter, disc.
Keywords: Solid state physics, Defect, Silicon, Annealing-laser, Solute-segregation, Diffusion equation, Finite difference method, Moving boundary problem.
Classification: 7.1.

Nature of problem:
The diffusion and segregation of impurities implanted in silicon which accompany the annealing of implantation damage by means of pulsed-laser irradiation.

Solution method:
The diffusion equation is semidiscretized by the finite difference method and the resulting ODE is integrated by an adapted Runge-Kutta method.

Unusual features:
The user should have no difficultly in replacing the CALCOMP plotting routines by equivalent routines at his own installation.

Running time:
Roughly proportional to the dimension of the ODE.